纳米面状磷酸锰的制备和表征

本文通过沉淀法制备了纳米面状的磷酸锰,并对其结构进行了X-射线粉末衍射(XRD)、透射电镜(TEM)、选区电子衍射(SAED)表征,讨论了温度和反应容器对产物的影响,结果表明在室温条件下能制备出纯的磷酸锰。     

Engineering acid dew temperature: the limitation for flue gas heat recovery

In order to study how deep we can reduce the temperature of exhaust flue gas, an experiment focusing on the combined influence of ash deposition and acid condensation on the heat transfer characteristics of the heat exchanger was carried out in a 300-MW boiler unit. An annular tube was inserted into the flue gas duct between the air preheater and the electrostatic precipitator. The water with given temperature firstly entered the inner tube and then flowed into the outer tube at the end of the inner tube. It is found that heat transfer performance drops sharply at fixed temperature range under given coal quality. The turning temperature is defined as the engineering acid dew temperature （EADT）. When the inlet water temperature is under the EADT, ash sticks to the tube and is difficult to blow off, and thus the flow resistance rises. Furthermore, the corrosion can be observed obviously. From the point of economy and reliability, EADT is the limitation for flue gas heat recovery. The EADT is at least 30 ℃ lower than ADT calculated by traditional empirical and theoretical equations.     

Microstructure and oxidation resistance of SiC–MoSi2 multi-phase coating for SiC coated C/C composites

In order to improve the anti-oxidation of C/C composites, a SiC–MoSi2multi-phase coating for SiC coated carbon/carbon composites(C/C)was prepared by low pressure chemical vapor deposition(LPCVD) using methyltrichlorosilane(MTS) as precursor, combined with slurry painting from MoSi2 powder. The phase composition and morphology were analyzed by scanning electron microscope(SEM) and X-ray diffraction(XRD) methods, and the deposition mechanism was discussed. The isothermal oxidation and thermal shock resistance were investigated in a furnace containing air environment at 1500 1C. The results show that the as-prepared SiC–MoSi2coating consists of MoSi2 particles as a dispersing phase and CVD–SiC as a continuous phase. The weight loss of the coated samples is 1.51% after oxidation at 1500 1C for 90 h, and 4.79% after 30 thermal cycles between 1500 1C and room temperature. The penetrable cracks and cavities in the coating served as the diffusion channel of oxygen, resulted in the oxidation of C/C composites, and led to the weight loss in oxidation.     

单双层石墨烯的制备及电导特性调控

石墨烯二维材料有着优异的物理、化学特性,在多个科学领域展现出广阔的应用前景.采用化学气相沉积方法在Cu-Ni合金表面制备了二维石墨烯薄膜并揭示其生长机制;研究生长时间、温度等对石墨烯覆盖度和晶格质量的影响.通过优化生长条件,成功制备了大面积单层及具有强烈层间耦合作用的AB堆叠双层石墨烯薄膜.进一步运用表面沉积技术在单层石墨烯上构建零维Au团簇和二维Au薄膜,研究其对石墨烯电导特性的影响;并结合第一性原理计算,揭示Au的形态及覆盖度影响石墨烯电导特性的规律.据此制作了石墨烯场效应晶体管器件,通过精确控制Au的覆盖度,实现石墨烯电导类型和载流子浓度的有效调控,拓展了其在微电子领域的应用.     

Bi_(1.6)La_(0.4)Ti_2O_7薄膜的制备及性能研究

采用化学溶液沉积法在ITO基片上制备不同退火温度的掺镧钛酸铋Bi1.6La0.4Ti2O7(BLT)薄膜。研究了其结构、介电性能、漏电流密度与外加电压I-V关系曲线和光学带隙。XRD射线衍射测试结果表明,经500、550、600℃1 h退火后的薄膜的主晶相为烧绿石结构,无杂相生成,600℃时BLT薄膜衍射峰比其他两种温度的强。在1 kHz频率下测得的介电常数、损耗因子分别为114,3%;129,3%;194,6%。BLT薄膜的漏电流密度与外加电压关系曲线表明,BLT薄膜600℃的漏电流比550和500℃稍微减小。通过透射谱分析得到BLT薄膜的光学带隙几乎不受温度影响,均为3.7 eV。这些结果表明制备BLT固溶体薄膜较佳为退火温度600℃,具有较好的性能,在光电器件有良好的应用前景。     

Properties and Morphology of TiN Films Deposited by Atomic Layer Deposition

In this study,TiN films were deposited on SiO2 substrates by Atomic Layer Deposition(ALD) using TiCl4and NH3 as precursors. Properties and morphology of the TiN films were characterized by different methods.Using Grazing Incidence X-Ray Diffraction(GIXRD),TiN films demonstrated polycrystalline structure with(111)preferred orientation. Film thickness was measured by Spectroscopic Ellipsometry(SE) and a stable growth rate of 0.0178 nm/cycle was reached after 500 deposition cycles,which was consistent with the essence of ALD as a surface-saturated self-limiting reaction. Film resistivity measured by a four-point probe continuously decreased with increasing deposition cycles until it reached the minimum value of 300μΩ cm at 5000 deposition cycles with a thickness of 87.04 nm. The surface roughness and morphology of the TiN films at different deposition cycles ranging from 50 to 400 were analyzed by Atomic Force Microscopy(AFM). The AFM results indicated that the initial film growth follows the Stranski-Krastanov mode.     

Cu衬底上ZnO纳米结构及其光催化性能分析

采用两步电化学沉积法在Cu衬底上沉积得到ZnO纳米结构薄膜。用X-射线衍射（XRD）和扫描电子显微镜（SEM）对其结构及形貌进行表征,发现先在Cu衬底上沉积一层Zn致密膜,更有利于在其表面上得到附着力强、形貌较好的ZnO纳米结构膜。系统考察了沉积温度和沉积时间等工艺参数对ZnO纳米结构的影响。结果表明,沉积温度和沉积时间对晶体结构和形貌有显著影响,通过对工艺进行适宜控制可以得到结晶性良好的六方纤锌矿型ZnO纳米结构膜。以罗丹明B为目标有机污染物,分析了ZnO膜的光催化性能,表明所制备的ZnO膜可以作为光催化剂,其光催化效率可达到72.4%。     

N/C对碳氮膜修饰的多壁碳纳米管细胞相容性的影响

为改善碳纳米管的细胞相容性,通过离子束辅助沉积方法在由化学气相沉淀法制备的多壁碳纳米管表面沉积纳米厚度的碳氮膜以进行表面修饰.通过观察L929小鼠肺部成纤维细胞、EAHY926人内皮细胞和兔血红细胞在修饰前后的碳纳米管表面的黏附和生长状态可知,沉积CNx膜的多壁碳纳米管的细胞相容性优于沉积前,表现出良好的生命活性和增殖状态,同时,较高的N/C比有利于细胞在沉积CNx膜碳纳米管表面的增殖和生长以及细胞形态的伸展.     

P型和N型Cu_2O薄膜的电化学制备

以FTO玻片为基底,在不同pH值下采用恒电位电化学沉积法制备Cu2O样品.利用XRD、SEM、EDS对样品的相组成、晶体结构、微观形貌和化学成分进行了表征,并对Cu2O薄膜的光电性质和载流子类型进行了测量和分析.结果表明Cu2O薄膜的半导体性质与所用电解液的酸碱度有关,在酸性条件下,如pH=4,5时制备的Cu2O薄膜为N型半导体,在中性和碱性条件下,如pH=6,7,8,9,10,11时,制备的Cu2O薄膜为P型半导体.实验结果对制备N型Cu2O以及Cu2O的PN型同质结提供了一种有效方法.     

基于FDM技术的多料口粒料3D打印 供料及挤料系统设计

FDM 3D打印机多采用由颗粒状热塑性材料加工而成的丝状热塑性材料,材料成本较高,且由于材料本身丝状的几何形状难以实现均匀混合,使得FDM彩色混色3D打印技术具有一定的局限性,难以实现多色混色打印。针对以上问题,根据传统挤出技术并结合熔融沉积(FDM)技术特点,研制了粒料式FDM 3D打印设备供料及挤出系统,原材料直接选用颗粒状塑料,并设计了多个进料口、储料仓和排气螺杆,进料采用穴播轮控制方式。设计结果可以实现不同颜色、不同塑料进料量的合理配比,使颗粒塑料实现充分熔化、加压、均化、排气、再均化、挤出过程,实现均质材质的粒料3D打印过程及多色混色打印过程。所提出的设计可以使用粒料直接进行3D打印,既降低了制料成本、缩短了制料周期,又实现了废料的有效利用,可为3D打印技术的发展提供参考。